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天目山隧道掘进粉尘监测与人员急性中毒原因分析
收稿日期: 2016-09-06
修回日期: 2017-01-05
网络出版日期: 2017-06-08
Dust Monitoring and Causes Analysis for Acute Poisoning of Working Staffs During Tianmushan Tunneling
Received date: 2016-09-06
Revised date: 2017-01-05
Online published: 2017-06-08
天目山隧道施工过程中,作业人员出现眼睛红肿及皮肤红肿、脱落等急性中毒症状。为探明急性中毒原因,通过监测隧道内粉尘体积质量变化、分析粉尘化学组分,辨识出引起中毒的有害物质。经检测发现,爆破后以2 274 m3/min的风量通风10 min,作业区的粉尘体积质量可降低至接触限值(1 mg/m3)以下;超前小导管钻孔时,作业区的粉尘体积质量为接触限值的56倍,作业人员会出现显著的急性中毒现象。另外,天目山隧道粉尘中钒、镍、锰和铬的含量以及围岩中砷、铜、铬、镍和钒的含量均较高,特别是急性中毒发生时隧道空气中钒和砷的体积质量最高,作业人员的症状与钒、砷的中毒诊断标准相符。可以判断,隧道作业人员急性中毒主要由以钒和砷为主的粉尘所致。
耿伟 , 付海陆 , 刘伟 , 庞伟 , 曾爱斌 , 官宝红 . 天目山隧道掘进粉尘监测与人员急性中毒原因分析[J]. 隧道建设, 2017 , 37(5) : 553 -559 . DOI: 10.3973/j.issn.1672-741X.2017.05.005
During the Tianmushan tunneling, some of the working staffs suffer from acute poisoning symptoms, such as bloodshot puffy eyes and red swollen skins followed by exfoliation. In order to find the causes of the acute poisoning, the hazardous substance that results in the acute poisoning is identified by monitoring the dust concentration variation in the tunnel and analyzing the chemical components of the dust. The detection results show that: 1) The dust concentration in the working zone can be lowered below exposure threshold, that is 1 mg/m3, after 10 min of ventilation with an air volume 2 274 m3/min after blasting. 2) The dust concentration in the working zone is 56 times exposure threshold during downthehole (DTH) drilling, which would causes acute poisoning symptoms of working staffs. 3) The concentrations of vanadium, nickel, manganese and chromium in the dust and those of arsenic, copper, chromium, nickel and vanadium in surrounding rocks are high, and the concentrations of vanadium and arsenic in section that acute poisoning of working staffs occurs are relatively high as well. The detection results coincide with the symptoms of vanadium and arsenic poisoning, which shows that the main causes of acute poisoning of working staffs are dust containing vanadium and arsenic.
Key words: Tianmushan Tunnel; acute poisoning; dust monitoring; vanadium; arsenic
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